Featuring exclusive and patented technology for performing spectroscopic ellipsometry and reflectometry, multiple-angle reflectometry, and reflection-transmission spectrophotometry, Bruker's extensive FilmTek™ product line enables more precise and repeatable measurement on more film types and thicknesses than comparable instruments. Designed for highly efficient, push-button operation, these instruments enable users to quickly, accurately, and non-destructively measure film thickness and refractive index, in addition to critical dimensions of structures and total thickness variation of substrates, on a broad array of single- and multilayer films with layer thickness from ultra-thin (down to <1 Å) to very thick (up to 350 μm). Measurable samples include, among others, metallic, semiconductor, amorphous, crystalline, and dielectric materials on virtually any substrate.
FilmTek ellipsometry and reflectometry systems are available in a variety of standard and customizable configurations, ranging from manual benchtop instruments to fully automated production-line-ready models. These include both single-technique and multimodal systems that combine our core technologies and augment their capabilities through additional technical integrations. With installed systems in the world’s top development labs and industrial production floors, these metrology tools boast the highest accuracy and refractive index resolution for many thick, thin, and multilayer film applications that are not feasible with other metrology systems and are suited for use in settings ranging from academic research and R&D to high-volume manufacturing in controlled environments.